Heatable lens for luminaires, and/or methods of making the same

ABSTRACT

Certain example embodiments of this invention relate to heatable glass substrates that may be used in connection with lighting applications, and/or methods of making the same. In certain example embodiments, a glass substrate supports an antireflective (AR) coating on a first major surface thereof, and a conductive coating on a second, opposite major surface thereof. Bus bars connect the conductive coating to a power source in certain example embodiments. The substrate may be heat treated (e.g., heat strengthened and/or thermally tempered), with one or both coatings thereon. The heatable glass substrate thus may help provide a chemical and/or environmental barrier for the luminaire or lighting system disposed behind it. In addition, or in the alternative, the heatable glass substrate may help reduce the amount of moisture (e.g., snow, rain, ice, fog, etc.) that otherwise could accumulate on the luminaire or lighting system.

This application is a Continuation-in-Part (CIP) of U.S. patentapplication Ser. No. 13/333,183, filed Dec. 21, 2011, which is a CIP ofU.S. patent application Ser. No. 12/926,714, filed Dec. 6, 2010, whichis a CIP of U.S. patent application Ser. Nos. 12/923,082, filed Aug. 31,2010, and 12/662,894, the latter of which is a CIP of U.S. patentapplication Ser. No. 12/659,196, filed Feb. 26, 2010, the disclosure ofeach of which are hereby incorporated herein by reference.

FIELD OF THE INVENTION

Certain example embodiments of this invention relate to heatable lensesfor luminaires, and/or methods of making the same. More particularly,certain example embodiments of this invention relate to glass substratesthat support antireflective and conductive coatings on opposing majorsurfaces thereof that help serve as chemical and environmental barriersto underlying luminaires and help remove moisture-related disturbancesfrom surfaces thereof and reduce transmission losses related toreflection, and/or methods of making the same.

BACKGROUND AND SUMMARY OF EXAMPLE EMBODIMENTS OF THE INVENTION

Moisture is known to condense on skylights, refrigerator/freezer doors,vehicle windows, lighting systems, and other glass-inclusive products.Condensation buildup on skylights detracts from the aesthetic appeal ofthe lite. Similarly, condensation buildup on refrigerator/freezer doorsin supermarkets or the like sometimes makes it difficult for shoppers toquickly and easily pinpoint the products that they are looking for.Condensation buildup on automobiles often is an annoyance in themorning, as a driver oftentimes must scrape frost or ice and/or actuatethe vehicle's defroster and/or windshield wipers to make it safer todrive. Moisture and fog on the windshield oftentimes presents a similarannoyance, although they may also pose potentially more significantsafety hazards as a driver traverses hilly areas, as sudden temperaturedrops occur, etc.

Condensation buildup on lighting systems (e.g., billboards, etc.) alsocan occur. In fact, given the widespread adoption of Solid-StateLighting (SSL) solutions and the fact that their light sources (e.g.,LEDs) typically do not generate infrared (IR) heat (unlike someHigh-Intensity Discharge (HID), Incandescent, and Halogen light sourcetechnologies) when generating light, the condensation problem can bemore severe, e.g., because of visibility and safety concerns. It isbelieved that no SSL-based solution has been able to be usedsuccessfully on a commercial scale in applications where the lightingfixture is directly exposed and susceptible (close to ground level) toice and snow build-up, and/or where full light output is critical forsafety (e.g., airport runways, walkways, stairs, etc.), for example.

Thus, it will be appreciated there is a need in the art for improvedlighting systems (e.g., SSL lighting systems) that do not suffer fromthese and/or other condensation issues.

One aspect of certain example embodiments of this invention relates to aheatable glass lens solution that provides localized heating to removecondensation (e.g., snow, ice, etc.) build-up thereon, that otherwisecould reduce the associated lighting system's light output andefficiency.

Another aspect of certain example embodiments of this invention relatesto a monolithic tempered coated glass solution that allows the glasslens to be rapidly and uniformly heated in a SSL fixture while alsoachieving high light output efficiency.

Certain example embodiments include a high transmittance conductivecoating (e.g., greater than about 87% on clear float glass), thatoptionally incorporate a visual antireflective (AR) coating on theopposite side of the monolithic glass lens to further enhance lighttransmission (e.g., for another 4% point visible light transmissiongain).

In certain example embodiments of this invention, a lens for a lightingsystem is provided. A glass substrate supports antireflective andtransparent coatings on first and second major surfaces thereof,respectively. At least one bus bar is in electrical communication withthe conductive coating, with the at least one bus bar being configuredto convey voltage to the conductive coating from an external powersource to, in turn, cause the conductive coating to heat up. Theantireflective and transparent coatings are sputtered coatings. Thesubstrate is heat treated together with the antireflective andtransparent coatings thereon.

According to certain example embodiments, a lighting system may includeone or more solid state lights (e.g., LEDs, OLEDs, PLEDs, PlasmaEmitting Discharge, etc., in an array or other format). The lensesdescribed herein may, for example, be interposed between the one or moresolid state lights and a viewer of the lighting system. A power sourceoperable to drive the conductive coating of the lens at a power densityof 1-6 W/in² is provided.

In certain example embodiments of this invention, a lighting systemincluding one or more solid state lights is provided. A lens is spacedapart from the one or more solid state lights. The lens includes: afirst glass substrate supporting a sputter-deposited antireflectivecoating on a major surface thereof and a second glass substratesupporting a sputter-deposited conductive coating on a major surfacethereof. The first and second substrates are laminated to one anothersuch that coated surfaces thereof face away from one another. The firstsubstrate with the antireflective coating thereon and/or the second withthe conductive coating thereon is/are heat treated.

In certain example embodiments of this invention, a method of making aheatable lens for a lighting system is provided. A multilayerantireflective coating is sputter deposited on a first major surface ofa glass substrate. A multilayer conductive coating is sputter depositedon a second major surface of the glass substrate, with the first andsecond major surfaces being opposite one another. The glass substrate isheat treated with the multilayer antireflective and conductive coatingsthereon. At least one bus bar is disposed on the glass substrate suchthat the at least one bus bar is in electrical communication with theconductive coating so as to heat the substrate when voltage is providedfrom an external power source.

According to certain example embodiments, a method of making a lightingsystem is provided. The methods of making the lenses described hereinmay be performed. A solid state light source is provided. The lens isprovided in spaced apart relation to the light source. The at least onebus bar of the lens is connected to an external power source.

The features, aspects, advantages, and example embodiments describedherein may be combined to realize yet further embodiments.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other features and advantages may be better and morecompletely understood by reference to the following detailed descriptionof exemplary illustrative embodiments in conjunction with the drawings,of which:

FIG. 1 is a cross-sectional view of an example heatable substrate inaccordance with certain example embodiments;

FIG. 2 is an example antireflective coating that may be used inconnection with certain example embodiments;

FIG. 3 is an example transparent coating that may be used in connectionwith certain example embodiments;

FIG. 4 is a flowchart showing an illustrative process for making theheatable substrate of FIG. 1, in accordance with certain exampleembodiments;

FIG. 5 is a cross-sectional view of an example heatable arrangement inaccordance with certain example embodiments; and

FIG. 6 is a flowchart showing an illustrative process for making theheatable arrangement of FIG. 5, in accordance with certain exampleembodiments.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS OF THE INVENTION

Certain example embodiments of this invention relate to heatable glasssubstrates that may be used in connection with lighting applications,and/or methods of making the same. In certain example embodiments, aglass substrate supports an antireflective (AR) coating on a first majorsurface thereof, and supports a conductive coating on a second majorsurface thereof, the first and second major surfaces being opposite oneanother. Bus bars connect the conductive coating to a power source incertain example embodiments. The substrate may be thermally tempered,e.g., with one or both coatings thereon. In other words, theantireflective coating and/or the conductive coating may survive thermaltempering processes.

Referring now more particularly to the accompanying drawings in whichlike reference numerals indicate like parts in the several views, FIG. 1is a cross-sectional view of an example heatable substrate in accordancewith certain example embodiments. As shown in FIG. 1, the substrate 1supports an antireflective coating 3 on a first major surface thereof,as well as a conductive coating 5 on an opposing major surface thereof.Bus bars in any suitable configuration may be used to help supply powerto the conductive coating 5 supported by the substrate 1. Theantireflective coating 3 is provided proximate to the outside of theoverall lighting assembly, whereas the conductive coating 5 is providedcloser to the light source(s) 9. The light source(s) 9 may be anysuitable light source(s). For instance, the light source(s) 9 maycomprise an array of LED, OLED, PLED, and/or other light sources indifferent example embodiments.

The bus bars 7 shown in FIG. 1 may provide an interface between theincoming electrical load and the conductive coating 5. In some cases,the bus bars 7 may be of or include Ag. In certain exampleimplementations, the bus bars 7 may be silkscreened on or otherwisedisposed in electrical contact with at least a portion of the conductivecoating 5 surface. The size, geometry, thickness, and detailed materialspecifications may be modified based on the requirements or desires forthe specific application.

The coated article in FIG. 1 is shown as being spaced apart from thelight source(s) 9. In this sense, the coated article essentially is alens for a luminaire serving, for example, as a chemical and/orenvironmental barrier therefor (e.g., by reducing the likelihood ofcondensation, snow, ice, and/or other moisture-related accumulations, aswell as serving as a barrier as to dirt, debris, etc.). However, incertain example embodiments, the coated article in FIG. 1 may belaminated to the light source(s) 9. Any suitable laminate may be used.For example, EVA, PVB, and/or any other suitable interlayer may be usedin different embodiments of this invention. In such cases, theconductive coating 5 may be supplemented or replaced by making theinterlayer heatable. This may be accomplished in certain exampleinstances by, for example, running a tungsten wire or other elementthrough a suitable thermally conductive material.

As alluded to above, the heatable lens may be an “active” coating in thesense that it is actively powered by an external power source. Thisexternal power source may, for example, provide constant heating in someimplementations. For instance, the glass may be kept at a constanttemperature, e.g., by utilizing a controller and a temperature gauge. Inother implementations, the external power source may be manually and/orautomatically actuatable. For instance, the power source may beconnected to one or more sensors and a controller. The controller maycause heating to be initiated when the temperature drops below a certainthreshold; when a vision and/or condensation sensor detects rain, snow,ice, fog, etc., on the surface of the lens, etc. Example condensationand/or light sensors are disclosed in, for example, U.S. Pat. Nos.8,109,141; 8,009,053; 7,830,267; 7,775,103; and 7,504,957, which arehereby incorporated herein by reference in their entireties. Accordingto certain example embodiments, the voltage that is applied may providesubstantially uniform heating for a predetermined amount of time, or anamount of time sufficient to remove the snow, ice, rain, etc. In somecases, continuous voltages may be applied. In other cases, pulsedvoltages may be applied, e.g., in accordance with the techniquesdisclosed in U.S. Pat. Nos. 7,964,821 and 7,518,093, which areincorporated herein by reference. It is noted that the low voltagesadvantageously do not present a sodium migration problem. The presenceof a silicon-inclusive base layer in the multilayer conductive thin filmalso helps block sodium migration.

The AR coating 3 may be any suitable AR coating in different exampleembodiments of this invention. Suitable AR coatings are described in,for example, U.S. Publication Nos. 2011/0157703 and 2012/0057236, aswell as U.S. application Ser. No. 12/929,481, filed on Jan. 27, 2011.The entire contents of each of these documents is hereby incorporatedherein by reference. It is noted that these AR coatings are desirablebecause they are heat treatable. That is, in certain exampleembodiments, these AR coatings may substantially maintain theiraesthetic qualities and high chemical and mechanical durability, evenafter exposure to temperatures typically encountered in thermaltempering and/or heat strengthening. These layers may be deposited viasputtering (e.g., Magnetron Sputtering Vacuum Deposition) or the like.

The AR coating 3 includes, in order moving away from the substrate,medium, high, and low index layers, and increases light transmission(e.g., reduces reflection) at least in the visible range of 390-750 nmwavelengths. These layers may directly contact one another in certainexample instances. In addition, in some cases, the AR coating 3 may be adielectric type coating in that each of layers is a dielectric layer(i.e., not electrically conductive). In certain example embodiments, thelow index layer may be of or include silicon or an oxide thereof (e.g.,SiO₂ or other suitable stoichiometry), MgF, or their alloyed oxide andfluoride. In certain example embodiments, the high index layer may be ofor include a metal oxide, metal nitride and/or metal oxynitride such astitanium oxide (e.g., TiO₂ or other suitable stoichiometry), zinc oxide,silicon or a nitride thereof, or the like. The AR coating component ofthe substrate thus may help increase light transmission and efficiencyof the luminaire or lighting system, e.g., by reducing second surfacereflection losses.

FIG. 2 is a cross-sectional view of an example AR coating in accordancewith certain example embodiments. In the FIG. 2 example, the mediumindex layer 21 is a bottom layer of the AR coating and has an index ofrefraction (n) of from about 1.60 to 2.0, more preferably from about1.65 to 1.9, even more preferably from about 1.7 to 1.8, and mostpreferably from about 1.7 to 1.79 (at 550 nm). At 380 nm, in certainexample embodiments, an ideal refractive index of medium index layer 21is from about 1.8 to 2.0. In further example embodiments, the index ofrefraction of medium index layer 21 is from about 1.65-1.8 at 780 nm.

In certain instances, it is advantageous that the material(s) comprisingmedium index layer 21 have desired optical and mechanical properties inthe as-deposited state as well as after exposure to temperatures typicalin tempering and/or heat treating environments. It will be appreciatedthat materials such as aluminum oxynitride, though having desiredproperties in the as-deposited state, may degrade in optical and/ormechanical properties after exposure to temperatures typical intempering and/or heat treating environments. Aluminum oxynitride may,however, be used in different embodiments of this invention if it can bemade to be sufficiently survivable.

Furthermore, it is advantageous if the medium index layer 21 has acompressive residual stress in both the as-coated and heat-treatedstates. In certain example embodiments, this compressive residual stressmay help to offset the tensile residual stress in the other layer(s) inthe stack. In certain instances, this may promote a net compressivestress in the three layer AR stack, which discourages cracking of thecoating during the tempering and/or heat treating processes.

Medium index layer 21 preferably has a thickness of from about 75 to 135nm, more preferably from about 80 to 130 nm, even more preferably fromabout 89 to 120 nm, and most preferably from about 94 to 115 nm.

It has surprisingly been found that silicon oxynitride (e.g., SiOxNy)can be deposited to have an index of refraction of from about 1.60 to2.0, more preferably from about 1.65 to 1.9, even more preferably fromabout 1.7 to 1.85 or 1.7 to 1.8, and most preferably from about 1.7 to1.79 (at 550 nm), and will not significantly degrade in its mechanicalor optical properties upon tempering and/or heat treatment. Moreover, incertain example embodiments, a layer of or comprising silicon oxynitride(e.g., SiOxNy) advantageously has a compressive residual stress in boththe as-coated and heat-treated states. Still further, in certain exampleembodiments, a layer of or comprising silicon oxynitride (e.g., SiOxNy)may produce the following advantages: 1) Small color shift (e.g., ΔE*<3units), after baking in an air environment at times and temperaturesranges typical for glass tempering processes; 2) Little to noappreciable degradation in the desired optical characteristics of thecoating after tempering in the visible region of the spectrum; and 3)Little to no appreciable change in the refractive index in the visibleportion of the spectrum after exposure to typically temperingenvironments. Therefore, it has advantageously been found that a layerof or including silicon oxynitride (e.g., SiOxNy) is suitable for use asa medium index layer 21 in a temperable three layer AR coating.

In certain example embodiments of this invention, the high index layer23 is provided over the medium index layer 21 of the AR coating 3. Highindex layer 23 has an index of refraction of at least about 2.0,preferably from about 2.1 to 2.7, more preferably from about 2.25 to2.55, and most preferably from about 2.3 to 2.5 (at 550 nm) in certainexample embodiments. In certain example embodiments, an ideal index ofrefraction of high index layer 23 at 380 nm may be from about 2.7 to 2.9(and all subranges therebetween). In further example embodiments, anideal index of refraction of high index layer 23 at 780 nm may be fromabout 2.2 to 2.4 (and all subranges therebetween).

High index layer 23 preferably has a thickness of from about 5 to 50 nm,more preferably from about 10 to 35 nm, even more preferably from about12 to 22 nm, and most preferably from about 15 to 22 nm. In certainexemplary embodiments, the high index layer 23 has a thickness of lessthan about 25 nm.

In certain instances, it is advantageous that the material(s) comprisinghigh index layer 23 have a high index of refraction. An example materialfor use as a high index layer is titanium oxide (e.g., TiOx). However,in certain example embodiments, titanium oxide has a high tensileresidual stress after exposure to temperatures above 300 degrees C. Thehigh tensile stress in this layer is associated with a phase change fromamorphous to crystalline, observed between the as-coated and as-heattreated states. This phase change, in certain instances, occurs at atemperature below the maximum temperature of exposure of the coatingduring a typical tempering and/or heat treating process. The greater thethickness of the titanium oxide-based layer, the greater the tensileresidual stress. Depending on the thickness of the titanium oxide-basedlayer (e.g., TiOx), the high tensile residual stress in the titaniumoxide-based layer can case an overall large net tensile stress in thethree layer stack. The titanium oxide may be stoichiometric TiO₂ orpartially oxygen deficient/sub-stroichiometric TiOx in differentembodiments of this invention. Of course, other materials (includingthose of or including TiOx) may be used in different embodiments of thisinvention.

Therefore, it will be advantageous in certain instances if a temperableAR coating including a high index layer of or including titanium oxide(e.g., TiOx) comprises other layers (e.g., medium index layer and/or lowindex layer) having and/or promoting net compressive residual stressafter tempering and/or heat treating, in order to offset the hightensile stress of titanium oxide based layer after exposure to hightemperatures. In other instances, it is further advantageous if thephysical thickness of the high index titanium oxide-based layer 23(e.g., of or including TiOx) can be reduced, while still maintaining theappropriate range of optical thicknesses to achieved desired opticalproperties of the temperable AR coating. In certain example embodiments,this will advantageously reduce the net tensile stress of the layer, andmay promote a net compressive residual stress for the overall coating.In other words, in certain example embodiments, when the physicalthickness of the titanium oxide-based layer is limited, and the otherlayers are of materials having compressive residual stresses aftertempering and/or heat treatment, it has surprisingly been found that achemically and mechanically durable tempered coated article with goodantireflective properties can be achieved.

In certain example embodiments of this invention, the low index layer 25is provided over the high index layer 23 of the AR coating 3. Layer 25has an index of refraction of from about 1.4 to 1.6, more preferablyfrom about 1.45 to 1.55, and most preferably from about 1.48 to 1.52 (at550 nm) in certain example embodiments. In certain example embodiments,an ideal index of refraction of low index layer 25 at 380 nm may be fromabout 1.48 to 1.52 (and all subranges therebetween). In further exampleembodiments, an ideal index of refraction of low index layer 25 at 780nm may be from about 1.46 to 1.5 (and all subranges therebetween).

In certain example embodiments, low index layer 25 has a thickness offrom about 70 to 130 nm, more preferably from about 80 to 120 nm, evenmore preferably from about 89 to 109 nm, and most preferably from about100 to 110 nm.

In certain instances, it is advantageous that the material(s) comprisinglow index layer 25 have an index of refraction lower than both themedium and high index layers, and in certain example embodiments, therefractive index of low index layer 25 may be less than that of theglass substrate upon which the coating is provided. An example materialfor use as or in a low index layer is silicon oxide (e.g., SiOx).

The use of silicon oxide (e.g., SiOx) as or in the low index layer in atemperable three layer AR coating in certain example embodiments isadvantageous because silicon oxide has a low refractive index, and highchemical and mechanical durability. Additionally, in certain exampleembodiments, a low index layer based on silicon oxide advantageously hasa compressive residual stress in both the as-coated andheat-treated/tempered states. In certain example embodiments, thecompressive residual stress in a low index layer based on silicon oxidemay help to offset the tensile residual stress in the titaniumoxide-based layer. Utilizing a low index layer with compressive residualstress in conjunction with a high index layer with high tensile residualstress helps to promote a net compressive stress in a temperable threelayer AR stack in certain example embodiments. This is advantageous inthat it may help discourage cracking of the AR coating 3 duringtempering and/or heat treating the coated article in certain exampleembodiments.

Example ranges for the thicknesses of each layer are as follows:

TABLE 1 Example Materials/Thicknesses (FIG. 2 Embodiment) Layer GlassRange (nm) More Preferred (nm) Example (nm) SiO_(x)N_(y) (21) 75-135 nm94-115 nm 95 nm TiO_(x) (23) 10-35 nm 12-22 nm 21 nm SiO_(x) (25) 70-130nm 89-109 nm 105 nm

The following tables show the as coated to heat treated (HT) colorshifts for the single sided AR coatings on low-iron glass. It will beappreciated that the heat treatment processes have a reduced (andsometimes no) appreciable impact on the aesthetic (e.g., reflectedcolor) quality of the coating. The example coatings described hereinhave purple hues as deposited, for example. The example purple hue ismaintained after heat treatment. This is particularly desirable in anumber of applications, where aesthetic quality in terms of reflectedcolor is correspondingly desired.

TABLE 2 Example AR Average Color Readings L* a* b* Y HT Trans 97.92−0.92 0.77 94.72 HT Glass 25.96 3.99 −3.93 4.73 HT Film 25.80 3.94 −3.954.68 Trans 97.56 −0.83 1.19 93.82 Glass 26.34 2.75 −3.46 4.86 Film 26.022.75 −3.30 4.75

TABLE 3 Example AR Predicted Color Shifts During HT ΔL* Δa* Δb* ΔY ΔETransmission 0.37 −0.09 −0.43 0.91 0.57 Glass −0.38 1.24 −0.47 −0.131.38 Film −0.22 1.20 −0.65 −0.07 1.38

Further example ranges for the thicknesses of each layer are as follows:

TABLE 4 Further Example Materials/Thicknesses (FIG. 2 Embodiment) LayerGlass Range (nm) More Preferred (nm) Example (nm) SiO_(x)N_(y) (21)45-85 nm 50-70 nm 60-61 nm TiO_(x) (23) 75-125 nm 85-115 nm 102 nmSiO_(x) (25) 70-130 nm 80-115 nm 87-93 nm

Ten samples with thicknesses of 60 nm, 102 nm, and 93 nm for the medium,high, and low index layers including the above-identified materials weregenerated. Averaged data from both Illuminate C and D65 observers at 2and 10 degrees, respectively, are provided in the table below.

TABLE 5 Average Performance Values for Table 3 Sample R_(vis) T_(vis)ΔE* R_(vis) T_(vis) ΔE* As Deposited 4.93 93.3 2.78 4.95 93.3 2.48Tempered 4.75 93.5 4.79 93.5 Illuminant C/2° D65/10°

As indicated in the table above, a color shift, ΔE*, between asdeposited and tempered of less than 3, is achieved. As can be seen inthe above table, when using illuminate C at 2° and illuminate D65 at 10°the ΔE* value for the above example 3 layer AR is below the desired ΔE*value of 3. Furthermore, both the R_(vis) and T_(vis) optical propertiesare substantially the same or similar pre- and post tempering. Suchattributes are desirable in producing tempered coated articles.

Changes in optical characteristics (e.g., ΔR_(vis), ΔT_(vis), ΔE*)between the as deposited and tempered states may be further reduced byadjusting the stochiometry of the SiOxNy in certain example instances.Alternatively, or in addition, optical characteristics (e.g., ΔR_(vis),ΔT_(vis), ΔE*) between the as deposited and tempered states may befurther reduced by adjusting the physical thickness of all the layers inthe stack (e.g., the medium, high, and low) in order to shift thespectral curve while maintaining the desired spectral bandpass.

It will be appreciated that in certain example embodiments, any layerstack arranged to have glass/medium/high/low, glass/high/low, high/lowalternating, etc., index layers may be used, provided that it suppliessuitable optics, e.g., matched to the desired application. In somecases, a layer comprising NbOx may replace a layer comprising TiOx. Insome cases, the bottom layer comprising SiOxNy may be considered abarrier layer and, as such, it may be replaced with materials, providedthat such materials do not interfere with the overall optics of the ARlayer stack.

Referring once again to FIG. 1, the conductive coating 5 shown thereinmay in some instances be a durable sputter-deposited heat treatablecoating. Suitable conductive coatings are disclosed in, for example,U.S. Publication No. 2011/0212311, as well as U.S. application Ser. No.13/333,183, filed Dec. 21, 2011. The entire contents of each of thesereferences is hereby incorporated herein by reference. Thus, it will beappreciated that the conductive coating 5 may, for example, include amultilayer thin film stack as shown, for example, in FIG. 3.

As shown in FIG. 3, the conductive coating 5 includes a layer comprisinga transparent conductive oxide (TCO) 33, sandwiched between an undercoatlayer 31 and an overcoat layer 35. The TCO inclusive layer 33 may have arefractive index of 1.7-2.1 at 550 nm. In some cases, the TCO inclusivelayer 33 may have an index of refraction of 1.9, e.g., in cases where itcomprises indium tin oxide (ITO). The sheet resistance of the TCOinclusive layer may be between 10-30 ohms/square in certain exampleembodiments. Its physical thickness preferably is 50-500 nm, morepreferably 75-250 nm, and still more preferably 100-170 nm. Theundercoat 31 and the overcoat 35 may be of or include an oxide and/ornitride of silicon. For instance, as shown in the FIG. 3 example, theundercoat 31 and the overcoat 35 each comprise SiOxNy. The undercoat 31and the overcoat 35 may have an index of refraction preferably of1.45-2.10, and 1.7 as an example, at 550 nm. The optical extinctioncoefficient may be close to 0 (e.g., <0.01) at 550 nm. The physicalthickness of such layers preferably is 5-500 nm, more preferably 25-250nm, and still more preferably 55-125 nm. It will be appreciated that, incertain example embodiments, the coating layer thickness may be tunedbased on the voltage supplied and the size of the substrate to arrive ata desired temperature or temperature range (e.g., 40 degrees C. in 20degrees C., ambient).

Example thicknesses and indices of refraction for each of the layers isprovided in the table that follows:

TABLE 6 Example Materials/Thicknesses (FIG. 3 embodiment) Example FirstSecond Example Preferred First Second Thickness Example Example Index ofIndex of Example Example Range Thickness Thickness Refraction RefractionIndex of Index of (nm) (nm) (nm) Range Range Refraction RefractionSiO_(x)N_(y) 30-100 60 70 1.5-2.1 1.7-1.8 1.75 1.7 ITO 95-160 105  105 1.7-2.1  1.8-1.93 1.88 1.9 SiO_(x)N_(y) 30-100 65 70 1.5-2.1 1.7-1.81.75 1.7 Glass N/A N/A N/A N/A N/A N/A N/A

Other variants of this layer stack are possible in different embodimentsof this invention. Such variants may include, for example, usingpartially or fully oxided and/or nitrided layers for the first and/orsecond silicon-inclusive layers, adding a protective overcoat comprisingZrOx, adding one or more index matching layers (e.g., comprising TiOx)between the glass substrate and the second silicon-inclusive layer, etc.For instance, certain example embodiments may involve modifying the FIG.3 example layer stack so as to replace the top layer comprising SiOxNywith SiN, add a layer comprising ZrOx (e.g., to potentially increasedurability), both replace the top layer comprising SiOxNy with SiN andadd a layer comprising ZrOx, etc. Thus, it will be appreciated that thepossible modifications listed herein may be used in any combination orsub-combination. It will be appreciated that the bottom layer comprisingSiOxNy need not necessarily be provided in all embodiments. Forinstance, ITO is a good blocker itself, and thus may not deteriorate (orallow other layers thereon) to suffer from the negative influences ofalkali ions migrating out of the glass. Thus, the ITO may be provideddirectly on the glass substrate in certain example embodiments.

The FIG. 3 example embodiment advantageously is very durable, e.g.,after heat treatment, even though it does not include an overcoat layercomprising ZrOx or the like (although a ZrOx inclusive or other overcoatlayer(s) may be provided in certain example embodiments, as indicatedabove). Thus, the FIG. 3 example layer stack is particularly well-suitedfor use in an assembly similar to that shown in FIG. 1.

As alluded to above, the FIG. 3 example layer stack is heat treatable incertain example embodiments. Such heat treatment may be accomplishedusing an infrared (IR) heater, a box or other furnace, a laser annealingprocess, etc. The table that follows includes performance data for themonolithic FIG. 3 layer stack post-belt furnace heat treatment (e.g., at650 degrees C.).

TABLE 7 Monolithic Annealed (Belt Furnace at 650 degrees C.) PerformanceData T 88.10 ΔE (Annealed to Tempered) 0.37 a*, Transmission −0.60 b*,Transmission 0.54 L*, Transmission 95.20 Rg 9.08 ΔE (Annealed toTempered) 1.04 a*, Glass Side −0.26 b*, Glass Side −2.16 L*, Glass Side36.14 Rf 9.06 ΔE (Annealed to Tempered) 1.16 a*, Film Side −0.69 b*,Film Side −2.28 L*, Film Side 36.10 Transmitted Color Rendering Index(CRI) 97.91 T-Haze 0.12 Surface Roughness 1.8 Sheet Resistance (NAGY)17-19 Hemispherical Emittance 0.19 or 0.20

Although certain conductive coatings have been described above, othervariations are possible. For instance, as indicated above, a conductivelayer stack of glass/ITO/Si-inclusive layer may be provided. Otherovercoats may be provided, e.g., to protect the ITO from over-oxidationduring heat treatment. In other cases, silver, aluminum-doped zincoxide, pyrolytically deposited fluorine-doped tin oxide, and/or othermaterials may be used, e.g., if they are provided at a suitablethickness. It is noted that although zinc-based transparent conductiveoxides (TCOs) typically are not very durable and sometimes aresusceptible to moisture attack, they may be used in protected (e.g.,laminated applications), e.g., of the types described herein. In othercases, ITO/Ag/ITO, AZO/ITO, and/or other layer stacks may be provided.It will be appreciated that the overcoat may be tuned to help improvevisible transmission when other materials (e.g., that do not have ashigh a visible transmission as ITO or where increased thicknesses aredesirable for conductivity purposes) are used. For instance, SnO:F andan overcoat layer comprising SiOx with a refractive index of 1.45-1.52may help provide visible transmission greater than 87%, especially if anAR coating is provided on an opposite major surface.

A post deposition heat treatment step may be advantageous in helping tore-crystallize the ITO layer and in helping to achieve the desiredemissivity and optics (e.g., including those described above). In thisregard, the tempered glass assembly (e.g., the substrate 1 including theAR coating 3 and the conductive coating 5) may meet the temperingrequirements of ASTM C1048, as well as the impact resistancerequirements of ANSI 297.1. In some cases, the assembly may be designedto support up to a 10 psi internal pressure load. The assembly alsopreferably is able to withstand temperature conditions of from about−55° C. to +55° C. In a similar vein, the thermal shock requirements ofMIL-C-7989, and the glass may reach a maximum operating temperature of120° C. in some cases. The assembly also may be structured to handle aninput power load of up to 100 VAC/DC. Of course, it will be appreciatedthat these performance metrics are provided by way of example, andcertain example embodiments of this invention may be structured to meetsome or all of these and/or other tests. The operating power density incertain example may be, for example, 1-6 W/in².

As alluded to above, the substrates may be glass substrates, e.g., sodalima silica substrates, or low-iron substrates. The thicknesses may be,for example, 1.0-10.0 mm, more preferably 3.0-6.0 mm. Low-iron glass isdescribed in, for example, U.S. Pat. Nos. 7,893,350; 7,700,870;7,557,053; 6,299,703; and 5,030,594, and U.S. Publication Nos.2006/0169316; 2006/0249199; 2007/0215205; 2009/0223252; 2010/0122728;2010/0255980; and 2011/0275506. The entire contents of each of thesedocuments is hereby incorporated herein by reference.

An exemplary soda-lime-silica base glass according to certainembodiments of this invention, on a weight percentage basis, includesthe following basic ingredients:

TABLE 8 Example Base Glass Ingredient Wt. % SiO₂ 67-75%  Na2O 10-20% CaO 5-15%  MgO 0-7% A1₂O₃ 0-5% K₂O 0-5%

Other minor ingredients, including various conventional refining aids,such as SO₃, carbon, and the like may also be included in the baseglass. In certain embodiments, for example, glass herein may be madefrom batch raw materials silica sand, soda ash, dolomite, limestone,with the use of sulfate salts such as salt cake (Na₂SO₄) and/or Epsomsalt (MgSO₄×7H₂O) and/or gypsum (e.g., about a 1:1 combination of any)as refining agents. In certain example embodiments, soda-lime-silicabased glasses herein include by weight from about 10-15% Na₂O and fromabout 6-12% CaO. In addition to the base glass (e.g., see Table 8above), in making glass according to certain example embodiments of theinstant invention the glass batch includes materials (includingcolorants and/or oxidizers) which cause the resulting glass to be fairlyneutral in color (slightly yellow in certain example embodiments,indicated by a positive b* value) and/or have a high visible lighttransmission. These materials may either be present in the raw materials(e.g., small amounts of iron), or may be added to the base glassmaterials in the batch (e.g., antimony and/or the like). In certainexample embodiments of this invention, the resulting glass has visibletransmission of at least 75%, more preferably at least 80%, even morepreferably of at least 85%, and most preferably of at least about 90%(sometimes at least 91%) (Lt D65).

In certain embodiments of this invention, in addition to the base glass,the glass and/or glass batch comprises or consists essentially ofmaterials as set forth in Table 9 below (in terms of weight percentageof the total glass composition):

TABLE 9 Example Additional Materials in Glass General More MostIngredient (Wt. %) Preferred Preferred total iron 0.001-0.06% 0.005-0.045% 0.01-0.03% (expressed as Fe₂O₃) % FeO 0-0.0040%   0-0.0030%0.001-0.0025%   glass redox (FeO/ <=0.10 <=0.06 <=0.04 total iron)cerium oxide  0-0.07%    0-0.04%   0-0.02% antimony oxide  0.01-1.0%  0.01-0.5%  0.1-0.3% SO₃  0.1-1.0%   0.2-0.6%  0.25-0.5% TiO₂   0-1.0% 0.005-0.4% 0.01-0.04%

In certain example embodiments, the antimony may be added to the glassbatch in the form of one or more of Sb₂O₃ and/or NaSbO₃. Note alsoSb(Sb₂O₅). The use of the term antimony oxide herein means antimony inany possible oxidation state, and is not intended to be limiting to anyparticular stoichiometry.

The low glass redox evidences the highly oxidized nature of the glass.Due to the antimony (Sb), the glass is oxidized to a very low ferrouscontent (% FeO) by combinational oxidation with antimony in the form ofantimony trioxide (Sb₂O₃), sodium antimonite (NaSbO₃), sodiumpyroantimonate (Sb(Sb₂O₅)), sodium or potassium nitrate and/or sodiumsulfate. In certain example embodiments, the composition of the glasssubstrate 1 includes at least twice as much antimony oxide as total ironoxide, by weight, more preferably at least about three times as much,and most preferably at least about four times as much antimony oxide astotal iron oxide.

In certain example embodiments of this invention, the colorant portionis substantially free of other colorants (other than potentially traceamounts). However, it should be appreciated that amounts of othermaterials (e.g., refining aids, melting aids, colorants and/orimpurities) may be present in the glass in certain other embodiments ofthis invention without taking away from the purpose(s) and/or goal(s) ofthe instant invention. For instance, in certain example embodiments ofthis invention, the glass composition is substantially free of, or freeof, one, two, three, four or all of: erbium oxide, nickel oxide, cobaltoxide, neodymium oxide, chromium oxide, and selenium. The phrase“substantially free” means no more than 2 ppm and possibly as low as 0ppm of the element or material.

The total amount of iron present in the glass batch and in the resultingglass, i.e., in the colorant portion thereof, is expressed herein interms of Fe₂O₃ in accordance with standard practice. This, however, doesnot imply that all iron is actually in the form of Fe₂O₃ (see discussionabove in this regard). Likewise, the amount of iron in the ferrous state(Fe²⁺) is reported herein as FeO, even though all ferrous state iron inthe glass batch or glass may not be in the form of FeO. As mentionedabove, iron in the ferrous state (Fe²⁺; FeO) is a blue-green colorant,while iron in the ferric state (Fe³⁺) is a yellow-green colorant; andthe blue-green colorant of ferrous iron is of particular concern, sinceas a strong colorant it introduces significant color into the glasswhich can sometimes be undesirable when seeking to achieve a neutral orclear color.

In view of the above, glasses according to certain example embodimentsof this invention achieve a neutral or substantially clear color and/orhigh visible transmission. In certain embodiments, resulting glassesaccording to certain example embodiments of this invention may becharacterized by one or more of the following transmissive optical orcolor characteristics when measured at a thickness of from about 1 mm -6mm (most preferably a thickness of about 3-4 mm; this is a non-limitingthickness used for purposes of reference only) (Lta is visibletransmission %). It is noted that in the table below the a* and b* colorvalues are determined per Ill. D65, 10 degree Obs.

TABLE 10 Glass Characteristics of Certain Example Embodiments More MostCharacteristic General Preferred Preferred Lta (LtD65): >=85% >=90% >=91% % τe (ISO 9050): >=85% >=90% >=91% % FeO (wt.%): <=0.004%   =0.003%  <=0.0020%    L* (Ill. D65, 10 deg.): 90-99 n/an/a a* (Ill. D65, 10 deg.): −1.0 to +1.0 −0.5 to +0.5 −0.2 to 0.0 b*(Ill. D65, 10 deg.): 0 to +1.5 +0.1 to +1.0 +0.2 to +0.7

In certain example embodiments, post tempering, the conductive coatingon a standard 3 mm standard soda lime silica glass substrate togethermay have a visible transmission of preferably at least 75%, morepreferably at least 80%, still more preferably at least 85%, andsometimes even 87% or higher. These values may be boosted by about 4%points when the AR coating is provided, e.g., such that when both areprovided on a standard 3 mm standard soda lime silica glass substrate,the assembly may have a visible transmission of preferably at least 79%,more preferably at least 84%, still more preferably at least 89%, andsometimes even 91% or higher. The transmission increase preferably is atleast about 3.0% points, more preferably 3.5% points, and sometimes atleast about 4% points as indicated above.

FIG. 4 is a flowchart showing an illustrative process for making theheatable substrate of FIG. 1, in accordance with certain exampleembodiments. A substrate is provided in step S401. In steps S403 andS405, the AR coating and conductive coatings are disposed on opposingmajor surfaces of the substrate, respectively. In some cases, it may bedesirable to provide the AR coating on the “tin side” of the glasssubstrate, e.g., such that residual or higher amounts of tin thereoneffectively helps with index matching/overall optics. In step S407, thesubstrate may be cut or sized, e.g., into multiple units, etc. Thecoatings may be removed from edge portions via an edge deletion process(such as, for example, grinding or the like). The substrate may be heattreated (e.g., heat strengthened and/or thermally tempered) in stepS411. The heat treated article then may be connected to a luminaireand/or built into a lighting system in step S413.

Part of the “installation” or final or near-final assembly process mayinclude, for example, disposing a gasket or other mounting features onthe substrate. Edge deletion proximate to contact areas for the gasketor other mounting features may be advantageous, in that the heatgenerated sometimes may melt or otherwise damage the gasket or othermounting features.

It will be appreciated that the example steps shown in and described inconnection with FIG. 4 may be performed in different orders in differentexample embodiments. For instance, steps S403 and S405 may be reversed,edge deletion may take place after tempering, etc. It also will beappreciated that some steps may be completely removed and that othersmay be added in some instances. For example, edge deletion is not alwaysrequired, a conductive coating need not necessarily be formed if aconductive laminate is provided, etc. In still other cases, these stepsmay be performed by one or more parties. For instance, a stock sheet maybe coated by a first manufacturer, e.g., that performs steps S403 andS405, and it may be cut or sized and/or tempered by a separate party.Still another party, perhaps a fabricator, may connect a heat treatedsubstrate to a luminaire or other lighting system. Thus, the process mayinclude various shipment steps that are not expressly shown therein butinstead should be understood from this description.

In certain example embodiments, the AR and the conductive coatings maybe sputter deposited and heat treatable. However, in certain otherexample embodiments, this need not necessarily be the case. Forinstance, the conductive coating may be a sputtered heat treatablecoating, whereas the AR coating may be a sputtered (and non-heattreatable coating), a wet-applied or other coating, etc. In other words,any suitable coating technique and/or layer stack may be used for the ARand conductive coatings.

FIG. 5 is a cross-sectional view of an example heatable arrangement inaccordance with certain example embodiments. FIG. 5 is similar to theFIG. 1 design. However, first and second substrates 1 a and 1 b arelaminated to one another via a laminating interlayer 51 (e.g., of orincluding EVA, PVB, and/or the like). The first substrate 1 a maysupport the antireflective coating 3, whereas the second substrate 1 bmay support the conductive coating 5. The example arrangement shown inFIG. 5 may be desirable in some instances, e.g., if a single temperedglass substrate is insufficiently strong for the desired application,and/or yet higher impact resistance is desired. The above-describedmodifications as to the substrates, the coatings, positions with respectto the light source(s), etc., also may be applied to the FIG. 5 examplein any suitable combination or sub-combination.

FIG. 6 is a flowchart showing an illustrative process for making theheatable arrangement of FIG. 5, in accordance with certain exampleembodiments. FIG. 6 is similar to FIG. 4, except that first and secondsubstrates are provided in step S401′. The AR coating is disposed on thefirst substrate in step S403,′ and the conductive coating is disposed onthe second substrate in step S405′. Much of the process is the same,except that in step S412, an interlayer is inserted between the firstand second substrates (e.g., with the coatings facing outwardly), andthe substrates are laminated together.

As indicated above, the coated articles described herein may or may notbe heat-treated (e.g., tempered) in different example embodiments. Suchtempering and/or heat treatment typically requires use of temperature(s)of at least about 580 degrees C., more preferably of at least about 600degrees C. and still more preferably of at least 620 degrees C. Theterms “heat treatment” and “heat treating” as used herein mean heatingthe article to a temperature sufficient to achieve thermal temperingand/or heat strengthening of the glass inclusive article. Thisdefinition includes, for example, heating a coated article in an oven orfurnace at a temperature of at least about 550 degrees C., morepreferably at least about 580 degrees C., more preferably at least about600 degrees C., more preferably at least about 620 degrees C., and mostpreferably at least about 650 degrees C. for a sufficient period toallow tempering and/or heat strengthening. This may be for at leastabout two minutes, or up to about 10 minutes, in certain exampleembodiments.

As used herein, the terms “on,” “supported by,” and the like should notbe interpreted to mean that two elements are directly adjacent to oneanother unless explicitly stated. For instance, a first layer may besaid to be “on” or “supported by” a second layer, even if there are oneor more layers there between.

The terms “peripheral” and “edge” as used herein do not mean theabsolute periphery or edge of the substrate, unit, etc., but insteadmean at or near (e.g., within about two inches) an edge of the same.

In certain example embodiments, a lens for a lighting system isprovided. A glass substrate supports antireflective and transparentcoatings on first and second major surfaces thereof, respectively. Atleast one bus bar is in electrical communication with the conductivecoating, with the at least one bus bar being configured to conveyvoltage to the conductive coating from an external power source to, inturn, cause the conductive coating to heat up. The antireflective andtransparent coatings are sputtered coatings. The substrate is heattreated together with the antireflective and transparent coatingsthereon.

In addition to the features of the previous paragraph, in certainexample embodiments, the antireflective coating may comprise, in ordermoving away from the substrate: a layer comprising silicon oxynitride; alayer comprising titanium oxide; and a layer comprising silicon oxide.

In addition to the features of either of the two previous paragraphs, incertain example embodiments, the antireflective coating may provide avisible transmission increase of 4% points, compared to a situationwhere no antireflective coating is provided.

In addition to the features of any one of the previously threeparagraphs, in certain example embodiments, post heat treatment, thelens may have a visible transmission of at least 87%.

In addition to the features of any one of the previously fourparagraphs, in certain example embodiments, the conductive coating maycomprise, in order moving away from the substrate, a layer comprising atransparent conductive oxide (TCO), and a silicon-inclusive overcoat.

In addition to the features of any one of the previously fiveparagraphs, in certain example embodiments, the antireflective coatingmay comprise, in order moving away from the substrate, high and lowrefractive index layers.

In addition to the features of any one of the previously six paragraphs,in certain example embodiments, the conductive coating may comprise alayer comprising a transparent conductive oxide (TCO) sandwiched betweenfirst and second layers comprising silicon oxynitride.

In addition to the features of the previous paragraph, in certainexample embodiments, the TCO may be indium tin oxide.

In addition to the features of either of the two previous paragraphs, incertain example embodiments, the layer comprising the TCO may have anindex of refraction of 1.7-2.1 at 550 nm.

In addition to the features of any one of the previously threeparagraphs, in certain example embodiments, the layer comprising the TCOmay have a sheet resistance of 10-30 ohms/square and a physicalthickness of 100-170 nm.

In addition to the features of any one of the previously fourparagraphs, in certain example embodiments, the first and second layerscomprising silicon oxynitride each may have refractive indexes of1.45-2.10 at 550 nm, and an extinction coefficient k of <0.01 at 550 nm.

In addition to the features of any one of the previously fiveparagraphs, in certain example embodiments, the physical thicknesses ofthe first and second layers comprising silicon oxynitride may be 55-125nm.

In addition to the features of any one of the previously six paragraphs,in certain example embodiments, the first and second layers comprisingsilicon oxynitride each may have refractive indexes of 1.7+/−0.2 at 550nm, and the layer comprising the TCO may have a refractive index of1.9+/−0.1 at 550 nm.

In addition to the features of any one of the previously thirteenparagraphs, in certain example embodiments, the heat treatment may bethermal tempering.

In certain example embodiments, a lighting system is provided. One ormore solid state lights are included. The lens of any one of theprevious fourteen paragraphs may be interposed between the one or moresolid state lights and a viewer of the lighting system. A power sourceis operable to drive the conductive coating of the lens at a powerdensity of 1-6 W/in².

In addition to the features of the previous paragraph, in certainexample embodiments, the one or more solid state lights may comprise anarray of organic and/or inorganic light emitting diodes.

In addition to the features of either of the two previous paragraphs, incertain example embodiments, the lens may be spaced apart from the oneor more solid state lights.

In certain example embodiments, a lighting system is provided. One ormore solid state lights are included. A lens is spaced apart from theone or more solid state lights, with the lens comprising: a first glasssubstrate supporting a sputter-deposited antireflective coating on amajor surface thereof; and a second glass substrate supporting asputter-deposited conductive coating on a major surface thereof, thefirst and second substrates being laminated to one another such thatcoated surfaces thereof face away from one another. The first substratewith the antireflective coating thereon and/or the second with theconductive coating thereon is/are heat treated.

In certain example embodiments, a method of making a heatable lens for alighting system is provided. A multilayer antireflective coating issputtering deposited on a first major surface of a glass substrate. Amultilayer conductive coating is sputtering deposited on a second majorsurface of the glass substrate, with the first and second major surfacesbeing opposite one another. The glass substrate with the multilayerantireflective and conductive coatings thereon is heat treated. At leastone bus bar is disposed on the glass substrate such that the at leastone bus bar is in electrical communication with the conductive coatingso as to heat the substrate when voltage is provided from an externalpower source.

In addition to the features of the previous paragraph, in certainexample embodiments, the antireflective coating may comprise, in ordermoving away from the substrate: a layer comprising silicon oxynitride; alayer comprising titanium oxide; and a layer comprising silicon oxide.

In addition to the features of the previous paragraph, in certainexample embodiments, the conductive coating may comprise a layercomprising a transparent conductive oxide (TCO) sandwiched between firstand second layers comprising silicon oxynitride.

In addition to the features of the previous paragraph, in certainexample embodiments, the layer comprising the TCO may have a sheetresistance of 10-30 ohms/square and a physical thickness of 100-170 nm.

In addition to the features of either of the two previous paragraphs, incertain example embodiments, the physical thicknesses of the first andsecond layers comprising silicon oxynitride may be 55-125 nm.

In addition to the features of any one of the previously threeparagraphs, in certain example embodiments, the first and second layerscomprising silicon oxynitride each may have refractive indexes of1.7+/−0.2 at 550 nm and an extinction coefficient k of <0.01 at 550 nm,and the layer comprising the TCO may have a refractive index of1.9+/−0.1 at 550 nm.

In addition to the features of any one of the previously fourparagraphs, in certain example embodiments, the heat treatment isthermal tempering.

In certain example embodiments, a method of making a lighting system isprovided. A lens is made in accordance with the method of any of theprevious seven paragraphs, for example. A solid state light source isprovided. The lens is provided in spaced apart relation to the lightsource. The at least one bus bar of the lens is connected to an externalpower source.

While the invention has been described in connection with what ispresently considered to be the most practical and preferred embodiment,it is to be understood that the invention is not to be limited to thedisclosed embodiment, but on the contrary, is intended to cover variousmodifications and equivalent arrangements included within the spirit andscope of the appended claims.

1. A lens for a lighting system, comprising: a glass substratesupporting antireflective and transparent coatings on first and secondmajor surfaces thereof, respectively; and at least one bus bar inelectrical communication with the conductive coating, the at least onebus bar being configured to convey voltage to the conductive coatingfrom an external power source to, in turn, cause the conductive coatingto heat up, wherein the antireflective and transparent coatings aresputtered coatings, and wherein the substrate is heat treated togetherwith the antireflective and transparent coatings thereon.
 2. The lens ofclaim 1, wherein the antireflective coating comprises, in order movingaway from the substrate: a layer comprising silicon oxynitride; a layercomprising titanium oxide; and a layer comprising silicon oxide.
 3. Thelens of claim 1, wherein the antireflective coating provides a visibletransmission increase of 4% points, compared to a situation where noantireflective coating is provided.
 4. The lens of claim 1, wherein postheat treatment, the lens has a visible transmission of at least 87%. 5.The lens of claim 1, wherein the conductive coating comprises, in ordermoving away from the substrate, a layer comprising a transparentconductive oxide (TCO), and a silicon-inclusive overcoat.
 6. The lens ofclaim 1, wherein the antireflective coating comprises, in order movingaway from the substrate, high and low refractive index layers.
 7. Thelens of claim 1, wherein the conductive coating comprises a layercomprising a transparent conductive oxide (TCO) sandwiched between firstand second layers comprising silicon oxynitride.
 8. The lens of claim 7,wherein the TCO is indium tin oxide.
 9. The lens of claim 7, wherein thelayer comprising the TCO has an index of refraction of 1.7-2.1 at 550nm.
 10. The lens of claim 9, wherein the layer comprising the TCO has asheet resistance of 10-30 ohms/square and a physical thickness of100-170 nm.
 11. The lens of claim 9, wherein the first and second layerscomprising silicon oxynitride each have refractive indexes of 1.45-2.10at 550 nm, and an extinction coefficient k of <0.01 at 550 nm.
 12. Thelens of claim 11, wherein the physical thicknesses of the first andsecond layers comprising silicon oxynitride are 55-125 nm.
 13. The lensof claim 11, wherein the first and second layers comprising siliconoxynitride each have refractive indexes of 1.7+/−0.2 at 550 nm, andwherein the layer comprising the TCO has a refractive index of 1.9+/−0.1at 550 nm.
 14. The lens of claim 1, wherein the heat treatment isthermal tempering.
 15. A lighting system, comprising: one or more solidstate lights; the lens of claim 1, interposed between the one or moresolid state lights and a viewer of the lighting system; and a powersource operable to drive the conductive coating of the lens at a powerdensity of 1-6 W/in².
 16. The lighting system of claim 15, wherein theone or more solid state lights comprise an array of organic and/orinorganic light emitting diodes.
 17. The lighting system of claim 15,wherein the lens is spaced apart from the one or more solid statelights.
 18. A lighting system, comprising: one or more solid statelights; and a lens spaced apart from the one or more solid state lights,the lens comprising: a first glass substrate supporting asputter-deposited antireflective coating on a major surface thereof; anda second glass substrate supporting a sputter-deposited conductivecoating on a major surface thereof, the first and second substratesbeing laminated to one another such that coated surfaces thereof faceaway from one another; wherein the first substrate with theantireflective coating thereon and/or the second with the conductivecoating thereon is/are heat treated.
 19. A method of making a heatablelens for a lighting system, the method comprising: sputtering depositinga multilayer antireflective coating on a first major surface of a glasssubstrate; sputtering depositing a multilayer conductive coating on asecond major surface of the glass substrate, the first and second majorsurfaces being opposite one another; heat treating the glass substratewith the multilayer antireflective and conductive coatings thereon; anddisposing at least one bus bar on the glass substrate such that the atleast one bus bar is in electrical communication with the conductivecoating so as to heat the substrate when voltage is provided from anexternal power source.
 20. The method of claim 19, wherein theantireflective coating comprises, in order moving away from thesubstrate: a layer comprising silicon oxynitride; a layer comprisingtitanium oxide; and a layer comprising silicon oxide.
 21. The method ofclaim 20, wherein the conductive coating comprises a layer comprising atransparent conductive oxide (TCO) sandwiched between first and secondlayers comprising silicon oxynitride.
 22. The method of claim 21,wherein the layer comprising the TCO has a sheet resistance of 10-30ohms/square and a physical thickness of 100-170 nm.
 23. The method ofclaim 22, wherein the physical thicknesses of the first and secondlayers comprising silicon oxynitride are 55-125 nm.
 24. The method ofclaim 21, wherein the first and second layers comprising siliconoxynitride each have refractive indexes of 1.7+/−0.2 at 550 nm and anextinction coefficient k of <0.01 at 550 nm, and wherein the layercomprising the TCO has a refractive index of 1.9+/−0.1 at 550 nm. 25.The method of claim 19, wherein the heat treatment is thermal tempering.26. A method of making a lighting system, the method comprising: makinga lens in accordance with the method of claim 19; providing a solidstate light source; providing the lens in spaced apart relation to thelight source; and connecting the at least one bus bar of the lens to anexternal power source.